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@@ -47,19 +47,10 @@ During normal incidence, a 100 μm confocal pinhole was used to improve the z-di
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Three types of models were established: defect-free models, point defect models, and surface defect models.
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Three types of models were established: defect-free models, point defect models, and surface defect models.
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不同模型使用不同的大小。
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无缺陷和点缺陷的模型
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不同大小被使用来建立不同的模型。
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无缺陷的声子使用 xxA x xxA x xxA 和 xxA x xxA x xxA 的模型计算。
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我们发现它们的结果没有显著差异,因此我们认为,对于无缺陷和点缺陷的模型,xxA x xxA x xxA 的模型大小是足够的,
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因此对于无缺陷和点缺陷的模型,我们使用 xxA x xxA x xxA 的模型大小。
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对于面缺陷,一个更大的 xxA x xxA x xxA 的模型被使用。
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The three types of models were established with different sizes.
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We first utilized both xxx and xxx models to
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点缺陷模型考虑了哪些结构
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无缺陷和点缺陷的模型尺寸为 xxA x xxA x xxA。
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我们认为是足够大的,因为无缺陷模型的结果与实验差距在一定范围内,且继续扩大模型对准确程度没有提升。
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对于点缺陷模型,我们考虑了 Si 空位、C 空位、N 替位、Al 替位。
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对于点缺陷模型,我们考虑了 Si 空位、C 空位、N 替位、Al 替位。
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分别记为 V#sub[Si]、V#sub[C]、N#sub[Si] 和 Al#sub[C]。
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分别记为 V#sub[Si]、V#sub[C]、N#sub[Si] 和 Al#sub[C]。
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考虑到 SiC 的对称性 p63mc (引用),有两个不同的位点,记为 k 和 h,
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考虑到 SiC 的对称性 p63mc (引用),有两个不同的位点,记为 k 和 h,
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@@ -67,8 +58,44 @@ We first utilized both xxx and xxx models to
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此外,还有人提出,N 替换 C、C 替换 Si 的模型(引用),
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此外,还有人提出,N 替换 C、C 替换 Si 的模型(引用),
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此结构除了 h 位与 k 位的区别以外,还需要考虑发生替换的两个原子位于面内还是面外(将会导致对称性的不同)。
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此结构除了 h 位与 k 位的区别以外,还需要考虑发生替换的两个原子位于面内还是面外(将会导致对称性的不同)。
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The defect-free and point defect models were established with a size of xxA x xxA x xxA.
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This size should be large enough to calculate phonon properties for defect-free and point defect 4H-SiC,
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since the defect-free results obtained with these models were within 5% errors of the experimental data,
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and further increasing the model size did not improve the accuracy.
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Twelve point defect models were considered, including Si vacancies (V#sub[Si]),
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C vacancies (V#sub[C]), nitrogen substitutions (N#sub[Si]), and aluminum substitutions (Al#sub[C]).
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Considering the symmetry of 4H-SiC, which is p63mc (cite),
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there are two different sites, k and h,
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which can be approximated as cubic (k) or hexagonal (h) based on the local environment.
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For point defect models, we considered five different structures,
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including Si vacancies (V#sub[Si]), C vacancies (V#sub[C]),
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nitrogen substitutions (N#sub[Si]), aluminum substitutions (Al#sub[C]),
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and the structure of a nitrogen substitute carbon and carbon substitute silicon (N#sub[C]C#sub[Si])
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which is proposed by xxx (ref) to be a possible structure of nitrogen doping.
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Besides,
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For surface defect models, larger models where used to ensure the accuracy of the phonon properties.
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(图:a k 位与 h 位对比 b 面内与面外对比)
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(图:a k 位与 h 位对比 b 面内与面外对比)
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因此对于无缺陷和点缺陷的模型,我们使用 xxA x xxA x xxA 的模型大小。
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对于面缺陷,一个更大的 xxA x xxA x xxA 的模型被使用。
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点缺陷模型考虑了哪些结构
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面缺陷模型考虑了哪些结构
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面缺陷模型考虑了哪些结构
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对于面缺陷模型,我们主要考虑了三类 BPD(引用自己的文章),这些缺陷在室温下被认为是可以稳定存在的。
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对于面缺陷模型,我们主要考虑了三类 BPD(引用自己的文章),这些缺陷在室温下被认为是可以稳定存在的。
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