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@@ -47,19 +47,10 @@ During normal incidence, a 100 μm confocal pinhole was used to improve the z-di
Three types of models were established: defect-free models, point defect models, and surface defect models.
不同模型使用不同的大小。
不同大小被使用来建立不同的模型。
无缺陷的声子使用 xxA x xxA x xxA xxA x xxA x xxA 的模型计算。
我们发现它们的结果没有显著差异因此我们认为对于无缺陷和点缺陷的模型xxA x xxA x xxA 的模型大小是足够的,
因此对于无缺陷和点缺陷的模型,我们使用 xxA x xxA x xxA 的模型大小。
对于面缺陷,一个更大的 xxA x xxA x xxA 的模型被使用。
The three types of models were established with different sizes.
We first utilized both xxx and xxx models to
点缺陷模型考虑了哪些结构
无缺陷和点缺陷的模型
无缺陷和点缺陷的模型尺寸为 xxA x xxA x xxA。
我们认为是足够大的,因为无缺陷模型的结果与实验差距在一定范围内,且继续扩大模型对准确程度没有提升。
对于点缺陷模型,我们考虑了 Si 空位、C 空位、N 替位、Al 替位。
分别记为 V#sub[Si]、V#sub[C]、N#sub[Si] Al#sub[C]
考虑到 SiC 的对称性 p63mc (引用),有两个不同的位点,记为 k h
@@ -67,8 +58,44 @@ We first utilized both xxx and xxx models to
此外还有人提出N 替换 C、C 替换 Si 的模型(引用),
此结构除了 h 位与 k 位的区别以外,还需要考虑发生替换的两个原子位于面内还是面外(将会导致对称性的不同)。
The defect-free and point defect models were established with a size of xxA x xxA x xxA.
This size should be large enough to calculate phonon properties for defect-free and point defect 4H-SiC,
since the defect-free results obtained with these models were within 5% errors of the experimental data,
and further increasing the model size did not improve the accuracy.
Twelve point defect models were considered, including Si vacancies (V#sub[Si]),
C vacancies (V#sub[C]), nitrogen substitutions (N#sub[Si]), and aluminum substitutions (Al#sub[C]).
Considering the symmetry of 4H-SiC, which is p63mc (cite),
there are two different sites, k and h,
which can be approximated as cubic (k) or hexagonal (h) based on the local environment.
For point defect models, we considered five different structures,
including Si vacancies (V#sub[Si]), C vacancies (V#sub[C]),
nitrogen substitutions (N#sub[Si]), aluminum substitutions (Al#sub[C]),
and the structure of a nitrogen substitute carbon and carbon substitute silicon (N#sub[C]C#sub[Si])
which is proposed by xxx (ref) to be a possible structure of nitrogen doping.
Besides,
For surface defect models, larger models where used to ensure the accuracy of the phonon properties.
a k 位与 h 位对比 b 面内与面外对比)
因此对于无缺陷和点缺陷的模型,我们使用 xxA x xxA x xxA 的模型大小。
对于面缺陷,一个更大的 xxA x xxA x xxA 的模型被使用。
点缺陷模型考虑了哪些结构
面缺陷模型考虑了哪些结构
对于面缺陷模型,我们主要考虑了三类 BPD引用自己的文章这些缺陷在室温下被认为是可以稳定存在的。