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SiC-2nd-paper/paper/method/model.typ
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== Atomic model establishment
我们建立了三类模型:无缺陷、点缺陷和面缺陷。
Three types of models were established: defect-free models, point defect models, and surface defect models.
无缺陷和点缺陷的模型
无缺陷和点缺陷的模型尺寸约为 $12.4 angstrom times 10.7 #sym.angstrom times 10.1 #sym.angstrom$,包含了大约 128 个原子。
我们认为是足够大的,因为无缺陷模型的结果与实验差距在一定范围内,且继续扩大模型对准确程度没有提升。
对于点缺陷模型,我们考虑了 Si 空位、C 空位、N 替位、Al 替位。
分别记为 V#sub[Si]、V#sub[C]、N#sub[Si] 和 Al#sub[C]。
考虑到 SiC 的对称性 p63mc (引用),有两个不同的位点,记为 k 和 h
根据局部环境近似为立方k还是六角h
此外还有人提出N 替换 C、C 替换 Si 的模型(引用),
此结构除了 h 位与 k 位的区别以外,还需要考虑发生替换的两个原子位于面内还是面外(将会导致对称性的不同)。
The defect-free and point defect models were established using supercells
with dimensions of $12.4 #sym.angstrom times 10.7 #sym.angstrom times 10.1 #sym.angstrom$,
containing approximately 128 atoms.
This supercell size was found sufficient for accurately capturing the phonon properties
of both defect-free and point-defect-containing 4H-SiC,
as the calculated phonon frequencies for the defect-free model deviated by less than 5% from experimental values,
and further enlargement of the supercell yielded negligible changes.
Twelve point defect models were constructed,
including Si vacancies (V#sub[Si]-h and V#sub[Si]-k), C vacancies (V#sub[C]-h and V#sub[C]-k),
N substitutions at C sites (N#sub[C]-h and N#sub[C]-k),
Al substitutions at Si sites (Al#sub[Si]-h and Al#sub[Si]-k),
and complex defects involving N substitution at a C site followed by C substitution at a Si site
@gerstmann_formation_2003
(N#sub[C]C#sub[Si]-i-h, N#sub[C]C#sub[Si]-i-k, N#sub[C]C#sub[Si]-o-h and N#sub[C]C#sub[Si]-o-k).
Here, the suffixes -h and -k denote the quasi-hexagonal and quasi-cubic sites, respectively,
while -i and -o denote the in-plane and out-of-plane configurations.
a hk 位置 b 复杂缺陷 强调在复杂缺陷中h k 根据 N 原子而定)
面缺陷的模型
对于面缺陷模型,主要考虑了三类 BPD引用自己的文章这些缺陷在室温下被认为是可以稳定存在的。
对于每类BPD我们考虑两个模型一个将两个 PD 包括在内,为了模拟 PBD 未分解或分解后边缘处的信号;
另一类则仅仅包含一个贯穿的层错,为了模拟 BPD 分解后在层错处的信号。