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SiC-2nd-paper/paper/method/default.typ
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= Method
== Experiment details
外延片的厚度、掺杂浓度、生长 C/Si 比,斜切角度。
5 个 6 寸的 p 型外延片被使用,我们将它们称为 W#sub[i]。
使用的衬底都是 n 型,前四个外延片的厚度为 1 微米,第五个外延片的厚度为 2 微米。
外延层的 Al 掺杂浓度分别为 0.1 3.8 5.1 6.4 10 E18 cm#super[-3],使用 SIMS 测试。
生长时 Si/C 比分别为 0.7 1.2 1.6 2.4 2.0。、
所有外延片都有 4 度斜切。
Five 6-inch p-type epitaxial wafers on n-type substrates were used, denoted as W#sub[1]-W#sub[5].
All epitaxial layers were grown using step-flow method with a 4° offcut angle.
The Al doping concentrations in the epitaxial layers
were 0.1, 3.8, 5.1, 6.4, and 10 #sym.times 10 cm#super[-3] (measured using SIMS)
with W#sub[1]-W#sub[4] having a thickness of 1 μm and W#sub[5] having a thickness of 2 μm, respectively.
The Si/C ratios of the five wafers during growth were 0.7, 1.2, 1.6, 2.4, and 2.0, respectively.
拉曼设备的型号。激光的波长,背散射。共焦针孔。
拉曼设备的型号是 LabRAM HR Evolution使用背散射。
大部分实验中,我们使用 532 nm 的激光,少部分实验中使用 325 nm 的激光以观测紫外拉曼。
有三个不同的入射配置,包括正入射、掠入射、边入射。
考虑到 4 度斜切和 4H-SiC 几乎各向同性的折射率() @shaffer_refractive_1971
在正散射过程中,我们使用 100 微米的共焦针孔,以尽可能提高 z 方向的分辨率 @song_depth_2020。
All our Raman experiments were performed using a LabRAM HR Evolution system with back-scattering configuration,
where collected scattered light has a reversed wavevector direction compared to the incident light.
A 532 nm laser was used in most experiments,
while a 325 nm laser was used to observe Raman signals under ultraviolet excitation.
Three different incidece configurations were used, as shown in @figure-incidence:
normal incidence, where the laser beam is perpendicular to the epitaxial surface;
grazing incidence, where the laser beam is nearly parallel to the epitaxial surface;
and edge incidence, where the laser beam is incident at the edge of the wafer, instead of the epitaxial surface.
Taking the
During the experiments, a 100 μm confocal pinhole was used to improve the z-direction resolution @song_depth_2020.
and the refracted light propagates with about 25 #sym.degree to the c axis;
#include "figure-incidence.typ"
== Simulation details
无缺陷的模型大小。带缺陷的情况下,模型大小,每个模型的代号和缺陷结构。
第一性原理计算使用 VASP使用 PBE PAW平面波截断能K 点网格,涂抹,自洽和弛豫的 threshold。
声子计算使用 phonopy phono3py ufoBEC 修正的算法。
// 在略入射的过程中,角度的关系不大(即使是 60 度入射,和 90 度入射差别也不大)。因此我们按照折射角 20 度的结果计算。
// 考虑到斜切,则大约是 24 度。